Chemical Etching of Fission Tracks in Polyfluoro Plastics

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Science  27 Jan 1978:
Vol. 199, Issue 4327, pp. 421-422
DOI: 10.1126/science.199.4327.421


A method has been developed for the chemical etching of fission tracks in polyfluoro plastics. The formation of fine holes several tens of nanometers in diameter in polyvinylidene fluoride films, bombarded by fission fragments in oxygen and etched in 5-normal sodium hydroxide solution at 85°C, was confirmed by electron microscopy.