Fabrication of submicrometer features on curved substrates by microcontact printing

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Science  04 Aug 1995:
Vol. 269, Issue 5224, pp. 664-666
DOI: 10.1126/science.7624795


Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.

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