Report

Quantum Electronic Stability of Atomically Uniform Films

See allHide authors and affiliations

Science  11 May 2001:
Vol. 292, Issue 5519, pp. 1131-1133
DOI: 10.1126/science.292.5519.1131

You are currently viewing the abstract.

View Full Text

Log in to view the full text

Log in through your institution

Log in through your institution

Abstract

We have studied the structural stability of thin silver films with thicknesses of N = 1 to 15 monolayers, deposited on an Fe(100) substrate. Photoemission spectroscopy results show that films of N = 1, 2, and 5 monolayer thicknesses are structurally stable for temperatures above 800 kelvin, whereas films of other thicknesses are unstable and bifurcate into a film with N ± 1 monolayer thicknesses at temperatures around 400 kelvin. The results are in agreement with theoretical predictions that consider the electronic energy of the quantum well associated with a particular film thickness as a significant contribution to the film stability.

  • * To whom correspondence should be addressed. E-mail: chiang{at}mrl.uiuc.edu

View Full Text