Optical Lithography Goes to Extremes--And Beyond

Science  03 Aug 2001:
Vol. 293, Issue 5531, pp. 785-786
DOI: 10.1126/science.293.5531.785

You are currently viewing the summary.

View Full Text

Via your Institution

Log in through your institution

Log in through your institution


LIVERMORE, CALIFORNIA-- In search of ever finer detail, chipmakers are pushing conventional printing techniques toward the physical limits of light. In April, researchers gathered here to unveil a machine that uses extreme ultraviolet light to print features on chips. The new machine has already created features as small as 80 nanometers across on silicon wafers; ultimately, researchers argue, the technology will be able to turn out features as small as 10 nanometers, nearly the same scale as molecular electronic devices.