PerspectiveMaterials Science

The Cutting Edge of Plasma Etching

See allHide authors and affiliations

Science  22 Feb 2008:
Vol. 319, Issue 5866, pp. 1050-1051
DOI: 10.1126/science.1153901

You are currently viewing the summary.

View Full Text

Log in to view the full text

Log in through your institution

Log in through your institution


Better etching methods for creating more finely structured microcircuits will require close attention to basic plasma physics and surface chemistry.