PerspectiveApplied Physics

Two Beams Squeeze Feature Sizes in Optical Lithography

See allHide authors and affiliations

Science  15 May 2009:
Vol. 324, Issue 5929, pp. 892-893
DOI: 10.1126/science.1174224

You are currently viewing the summary.

View Full Text

Log in to view the full text

Log in through your institution

Log in through your institution


The fabrication of electronic circuits on chips relies on the patterning of surfaces by optical lithography, which is used to control where different components—metal wires, semiconductor gates, and oxide insulators—form (1). Three papers in this issue (24) report a new approach to optical lithography that allows small feature sizes to be created more easily than with traditional approaches.