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Subtractive Patterning via Chemical Lift-Off Lithography

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Science  21 Sep 2012:
Vol. 337, Issue 6101, pp. 1517-1521
DOI: 10.1126/science.1221774

Article Information

vol. 337 no. 6101 1517-1521

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History: 
  • Received for publication March 12, 2012
  • Accepted for publication August 1, 2012

Author Information

  1. Wei-Ssu Liao1,2,
  2. Sarawut Cheunkar1,3,
  3. Huan H. Cao1,2,
  4. Heidi R. Bednar1,2,
  5. Paul S. Weiss1,2,3,4,5,*,
  6. Anne M. Andrews1,2,6,7,*
  1. 1California NanoSystems Institute, University of California, Los Angeles, CA 90095, USA.
  2. 2Department of Chemistry and Biochemistry, University of California, Los Angeles, CA 90095, USA.
  3. 3Department of Chemistry, Pennsylvania State University, University Park, PA 16802, USA.
  4. 4Department of Materials Science and Engineering, University of California, Los Angeles, CA 90095, USA.
  5. 5Department of Physics, Pennsylvania State University, University Park, PA 16802, USA.
  6. 6Department of Psychiatry and Biobehavioral Health, University of California, Los Angeles, CA 90095, USA.
  7. 7Semel Institute for Neuroscience and Human Behavior, University of California, Los Angeles, CA 90095, USA.
  1. *To whom correspondence should be addressed. E-mail: aandrews{at}mednet.ucla.edu (A.M.A.); psw{at}cnsi.ucla.edu (P.S.W.)

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