Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

See allHide authors and affiliations

Science  22 Apr 2010:
DOI: 10.1126/science.1187851


For patterning organic resists, optical and electron beam lithography are the most established methods, but at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe. We demonstrate patterning at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution. These patterns can be transferred to other substrates, and material can be removed in successive steps in order to fabricate complex three-dimensional structures.