Atomic Resolution of the Silicon (111)-(7x7) Surface by Atomic Force Microscopy

See allHide authors and affiliations

Science  06 Jan 1995:
Vol. 267, Issue 5194, pp. 68-71
DOI: 10.1126/science.267.5194.68


Achieving high resolution under ultrahigh-vacuum conditions with the force microscope can be difficult for reactive surfaces, where the interaction forces between the tip and the samples can be relatively large. A force detection scheme that makes use of a modified cantilever beam and senses the force gradient through frequency modulation is described. The reconstructed silicon (111)-(7x7) surface was imaged in a noncontact mode by force microscopy with atomic resolution (6 angstroms lateral, 0.1 angstrom vertical).