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Memory Metamaterials

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Science  18 Sep 2009:
Vol. 325, Issue 5947, pp. 1518-1521
DOI: 10.1126/science.1176580

Article Information

vol. 325 no. 5947 1518-1521

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History: 
  • Received for publication May 20, 2009
  • Accepted for publication August 4, 2009
  • .

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Author Information

  1. T. Driscoll1,*,
  2. Hyun-Tak Kim2,
  3. Byung-Gyu Chae2,
  4. Bong-Jun Kim2,
  5. Yong-Wook Lee2,3,
  6. N. Marie Jokerst4,
  7. S. Palit4,
  8. D. R. Smith4,
  9. M. Di Ventra1 and
  10. D. N. Basov1
  1. 1Department of Physics, University of California at San Diego (UCSD), La Jolla, CA 92093, USA.
  2. 2Metal-Insulator Transition Lab, Electronics and Telecommunications Research Institute (ETRI), Daejeon 305-350, Republic of Korea.
  3. 3School of Electrical and Engineering, Pukyong National University, Busan 608-739, Republic of Korea.
  4. 4Center for Metamaterials and Integrated Plasmonics and Electrical and Computer Engineering Department, Duke University, Post Office Box 90291, Durham, NC 27708, USA.
  1. *To whom correspondence should be addressed. E-mail: tdriscol{at}physics.ucsd.edu

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